Hybrid PVD System (Hybrid Physical Vapor Deposition System)
This is a multi-phase composite coating system which meets any needs of customers by using the ultimate combination of Linear Ion Source, UBM Sputter, and FCVA Source.
Specification
| Size |
Custom-made |
| Jig |
6 axis rotation type |
| Precursor Gas |
mass flow control system
Ar, N2, O2, C2H2, CH4, C6H6, etc |
| Plasma Source |
Linear ion source
Unbalanced Magnetron Sputter
Filtered Cathodic Vacuum Arc |
| Base Pressure |
~10-6 torr |
| Bias Power |
DC Pulse |
| Heater |
Max. 450°C |
| Device Operation |
Fully Automatic/Semi Automatic |
| System Operation Software |
- Safety Lock for the equipment and the operator.
- Operator can easily select between fully automatic and semi automatic processes by using software program based MS windows.
- work reports are automatically saved during coating processes.
- Entire process of coatings can be stored as data
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| LIS |
UBM Sputter |
FCVA |
SOFTWARE |
Linear Ion Source
This LIS system is closed-drift or anode-layer ion beam source type, which has capability of irradiating uniform ion beams over large surface area (from few centimeters to 120cm) and obtaining relatively high energy (50~1,500eV). It can also easily obtain ions from most of inert gases and ordinary gases. Applications for this LIS system include cleaning, deposition, and ion beam assisted deposition. DLC (Diamond-like Carbon) coating uses hydrocarbon family gases such as C6H6, C2H2, and CH4.
| Specifications |
LIS 350 |
LIS 666 |
LIS 800 |
LIS 1200 |
| Dimensions |
W102 x H380mm |
W102 x H680mm |
W102 x H840mm |
W102 x H1244mm |
| Weight |
11.87kg |
22.59kg |
27.14kg |
40.7kg |
| Magnetic type |
Permanent |
| Usable Beam Length |
340mm |
656mm |
790mm |
1190mm |
| Uniformity |
±3% |
| Discharge Voltage Range |
500-3000V |
| Max power |
2kW |
2.1kW |
3kW |
5kW |
| Operating Pressure |
0.7-3mtorr |
| Gas Type |
Ar, N2, O2, C2H2, CH4, etc. |
Advantages of LIS
- Stable ionized energy during deposition process
- Formation of high quality coating in large surface area
- Low cost operation
- Cleaning using Ar, O2, and N2 gases
Characteristics of DLC coating deposited using LIS
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Deposition Rate
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300nm/min |
| Residual Stress |
~2.0Gpa |
| Hardness |
~28Gpa |
| Coeffecient of Friction |
~0.1 |
Hard Coating Applications
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| Mould |
Automotive Parts |
Metal Mask |
Ceramic |
UBM Sputter (Unbalanced Magnetron Sputter)
| Principle of Plasma Generation of UBM Sputter |
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A magnetron consists of a target with magnets arranged behind it to make a magnetic trap for charged particles, such as argon ions, in front of the target. When negative voltage is supplied to the target, argon ions are attracted to the target surface. Then atoms of the target are knocked out with mean kinetic energythis is SPUTTERING. Secondary electrons are emitted from the target surface that become trapped by the magnetic fields and undergo further ionizing collisions sustaining the plasma. Confinement between a negatively biased target and closed magnetic field produces a dense plasma. |
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| Specifications |
UBM 350 |
UBM 680 |
UBM 800 |
UBM 1200 |
| Dimensions |
W100 x H350 mm |
W100 x H680 mm |
W100 x H800 mm |
W100 x H1200 mm |
| Weight |
20.06kg |
34.1kg |
40.12kg |
60.18kg |
| Magnetic type |
Permanent(NdfeB) |
| Uniformity |
±5% |
| Max power |
1.0kW |
1.5kW |
2.5kW |
8kW |
| Operating Pressure |
0.5-10 mtorr |
Advantage of UBM Sputter
- Able to deposit on alloy metals, chemical compounds, and insulating layer.
- Possible reactive sputtering by using various reactive gases.
- Uniformity of deposited layer thickness.
- Able to use on a target with large surface area.
- No formation of macro particles.
- Low temperature process
FCVA (Filtered Cathodic Vacuum Arc)
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Filtered Vacuum Arc is able to evaporate the material of cathode by using arc discharge and deposit this material on the substrate.
The biggest problem in arc deposition is the droplets (macro particles) formed, which can reach up to a few μm in size. These droplets adversely affect the property of thin films, especially the surface morphology.
By filtering macro and neutral particles, this system improves the overall properties, such as hardness, surface morphology, and etc.
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| Specifications |
Single bent |
Double bent |
| CATHODE |
| Material |
Graphite |
| Size |
Ø55 x 15(L)mm |
| Body |
304 Stainless steel |
| DUCT |
| Beam Size |
I.D.Ø144mm |
| Angle |
45° |
| Material |
304 Stainless Steel |
| Filtering |
Single |
Double, Easily converted to single-filtering |
| Magnet |
Source magnet (SM)
Bending magnet (BM)
Output magnet(OM) |
Source magnet (SM)
Bending magnet (BM)
Emission magnet(EM)
Output magnet (OM) |
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| Single bent |
Double bent |
Arc beam |
Structure and Principle of FCVA Source
Advantages of FCVA
- Removal of droplets through dual bent duct and ultra smooth surface morphology .
- Coating ability over a large surface area using beam rastering.
- Innovative electrode design for stability of plasma beam.
- High adhesion on target material.
- High reproducibility and easiness of maintenance.
Characteristics of ta-C Thin Film, deposited by Dural Bent FCVA
| Deposition Rate |
5nm/min |
| Surface Roughness |
0.02nm |
| Hardness |
~ 80GPa |
| Coeffecient of Friction |
~ 0.1 |
Hard Coating Applications
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| Tools for machining of non-ferrous metal, Micro drills |
Aspheric Lens Moulds |
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